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http://localhost:8080/xmlui/handle/123456789/25112| Title: | Implantation ionique et traitements thermiques en technologie silicium |
| Authors: | BAUDRANT, Annie |
| Keywords: | Silicium : Substrats.Technologie silicium sur isolant |
| Issue Date: | 2011 |
| Publisher: | Paris |
| Description: | 2.620.180;365p |
| URI: | https://di.univ-blida.dz/jspui/handle/123456789/25112 |
| Appears in Collections: | ouvrage |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| 2.620.180.pdf | 2,98 MB | Adobe PDF | View/Open |
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