Chemical vapor deposition: principles and applications

dc.contributor.author	Hitchman, Michael L.
dc.contributor.author	Jensen, Klavs F.
dc.date.accessioned	2024-11-06T08:52:11Z
dc.date.available	2024-11-06T08:52:11Z
dc.date.issued	1993
dc.identifier.isbn	0123496705
dc.identifier.uri	https://di.univ-blida.dz/jspui/handle/123456789/32655
dc.description	V-677 p.; 24 cm	fr_FR
dc.language.iso	en	fr_FR
dc.publisher	Academic Press	fr_FR
dc.subject	Chemical vapor deposition	fr_FR
dc.title	Chemical vapor deposition: principles and applications	fr_FR
dc.type	Book	fr_FR