Afficher la notice abrégée
| dc.contributor.author |
Michael L, Hitchman |
|
| dc.date.accessioned |
2024-12-11T12:04:54Z |
|
| dc.date.available |
2024-12-11T12:04:54Z |
|
| dc.date.issued |
1993 |
|
| dc.identifier.isbn |
0123496705 |
|
| dc.identifier.uri |
https://di.univ-blida.dz/jspui/handle/123456789/35306 |
|
| dc.description |
V-677 p.24 cm |
fr_FR |
| dc.language.iso |
fr |
fr_FR |
| dc.publisher |
Academic Press |
fr_FR |
| dc.subject |
Chemical vapor deposition |
fr_FR |
| dc.title |
Chemical vapor deposition |
fr_FR |
| dc.title.alternative |
Chemical vapor deposition |
fr_FR |
| dc.type |
Book |
fr_FR |
Fichier(s) constituant ce document
Ce document figure dans la(les) collection(s) suivante(s)
Afficher la notice abrégée