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Please use this identifier to cite or link to this item: http://localhost:8080/xmlui/handle/123456789/32655
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dc.contributor.authorHitchman, Michael L.-
dc.contributor.authorJensen, Klavs F.-
dc.date.accessioned2024-11-06T08:52:11Z-
dc.date.available2024-11-06T08:52:11Z-
dc.date.issued1993-
dc.identifier.isbn0123496705-
dc.identifier.urihttps://di.univ-blida.dz/jspui/handle/123456789/32655-
dc.descriptionV-677 p.; 24 cmfr_FR
dc.language.isoenfr_FR
dc.publisherAcademic Pressfr_FR
dc.subjectChemical vapor depositionfr_FR
dc.titleChemical vapor deposition: principles and applicationsfr_FR
dc.typeBookfr_FR
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