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Please use this identifier to cite or link to this item: http://localhost:8080/xmlui/handle/123456789/32655
Title: Chemical vapor deposition: principles and applications
Authors: Hitchman, Michael L.
Jensen, Klavs F.
Keywords: Chemical vapor deposition
Issue Date: 1993
Publisher: Academic Press
Description: V-677 p.; 24 cm
URI: https://di.univ-blida.dz/jspui/handle/123456789/32655
ISBN: 0123496705
Appears in Collections:Livres

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